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Photoemission study of the negative electron affinity surfaces of O/Cs/Si(001)2×1 and O/K/Si(001)2×1ABUKAWA, T; ENTA, Y; KASHIWAKURA, T et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1990, Vol 8, Num 4, pp 3205-3209, issn 0734-2101Article

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A proposal for a new type of thin-film field-emission display by edge breakdown of MIS structureKONOPSKY, V. N.Journal of physics. D, Applied physics (Print). 1998, Vol 31, Num 6, pp 617-621, issn 0022-3727Article

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